Effect of surfactant concentration on the stacking modes of organo-silylated layered double hydroxides

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	Tao Qi; Yuan Jie; Frost Ray L.; He Hongping; Yuan Peng; Zhu Jianxi
	Effect of surfactant concentration on the stacking modes of organo-silylated layered double hydroxides
Source Publication	Applied Clay Science
ISSN	0169-1317
	2009
Volume	45 Issue:4 Pages:262-269
Language	英语
WOS ID	WOS:000268798300013
Indexed By	sci
Citation statistics	Cited Times:48[WOS] [WOS Record] [Related Records in WOS]
Document Type	期刊论文
Identifier	http://ir.gig.ac.cn/handle/344008/14847
Collection	中国科学院广州地球化学研究所
Recommended Citation GB/T 7714	Tao Qi,Yuan Jie,Frost Ray L.,et al. Effect of surfactant concentration on the stacking modes of organo-silylated layered double hydroxides[J]. Applied Clay Science,2009,45(4):262-269.
APA	Tao Qi,Yuan Jie,Frost Ray L.,He Hongping,Yuan Peng,&Zhu Jianxi.(2009).Effect of surfactant concentration on the stacking modes of organo-silylated layered double hydroxides.Applied Clay Science,45(4),262-269.
MLA	Tao Qi,et al."Effect of surfactant concentration on the stacking modes of organo-silylated layered double hydroxides".Applied Clay Science 45.4(2009):262-269.

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